Advances in Imaging and Electron Physics, Volume 237 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release include Stochastic geometry with applications in materials science, Morphological models of random media, Grain models and application to microstructure simulation, MCMC algorithms for model parameterization, Tessellations models, Tesselation models, Fast simulation of tessellation models using Eikonal equation, Applications to Image Processing, Synthesis of Training Images for Supervised Learning Problems, and Segmentation Methods Based on the Eikonal Equation.

• Provides the authority and expertise of leading contributors from an international board of authors
• Presents the latest release in the Advances in Imaging and Electron Physics series