Spin Electronics
Editat de David D. Awschalom, Robert A. Buhrman, James M. Daughton, Stephan von Molnár, Michael L. Roukesen Limba Engleză Hardback – 31 dec 2003
Preț: 617.57 lei
Preț vechi: 726.55 lei
-15%
Puncte Express: 926
Carte tipărită la comandă
Livrare economică 16-30 iulie
Livrare prin curier în România Termenul estimat este afișat lângă disponibilitate.
Transport gratuit pentru acest produs Plată online sau ramburs, în funcție de opțiunile comenzii.
Retur gratuit în 14 zile Comandă securizată și suport în română.
Specificații
ISBN-13: 9781402018022
ISBN-10: 1402018029
Pagini: 226
Ilustrații: XXIV, 198 p.
Dimensiuni: 155 x 235 x 18 mm
Greutate: 0.47 kg
Ediția:2004
Editura: SPRINGER NETHERLANDS
Colecția Springer
Locul publicării:Dordrecht, Netherlands
ISBN-10: 1402018029
Pagini: 226
Ilustrații: XXIV, 198 p.
Dimensiuni: 155 x 235 x 18 mm
Greutate: 0.47 kg
Ediția:2004
Editura: SPRINGER NETHERLANDS
Colecția Springer
Locul publicării:Dordrecht, Netherlands
Public țintă
ResearchCuprins
1. Spin Electronics—Is It the Technology of the Future?.- 2. Materials for Semiconductor Spin Electronics.- 3. Fabrication and Characterization of Magnetic Nanostructures.- 4. Spin Injection, Spin Transport and Spin Transfer.- 5. Optoelectronic Manipulation of Spin in Semiconductors.- 6. Magnetoelectronic Devices.- Appendices.- A. Appendix A. Biographies of Team Members.- B. Appendix B. Site Reports—Europe.- Johannes Kepler University.- Unité Mixte de Physique CNRS/THALES.- INESC.- RWTH Aachen.- University of Hamburg.- University of Twente.- University of Basel.- University of Wuerzburg.- University of Hamburg.- IMEC.- QinetiQ.- Trinity College.- Imperial College of Science, Technology and Medicine.- University of Cambridge.- University of Cambridge.- University of Glasgow.- University of Nottingham.- University of Regensburg.- C. Appendix C. Site Reports — Japan.- University of Tokyo.- The Institute for Solid State Physics.- Tokyo Institute of Technology.- Tokyo Institute of Technology.- Waseda University.- Tokyo Univ. of Agriculture and Technology.- Kanagawa Academy of Science and Technology (KAST).- Tokyo Institute of Technology.- Fujitsu Laboratories Ltd..- NTT Basic Research Laboratory.- NEC Fundamental Research Laboratories (FRL).- Joint Research Center for Atom Technology (JRCAT).- Japan Advanced Institute of Science and Technology.- University of Tokyo, Department of Physics.- University of Tokyo, Department of Electrical Engineering.- The Institute of Scientific and Industrial Research.- Osaka University.- Tohoku University, Research Institute of Electrical Communication (RIEC).- Tohoku University, Department of Applied Physics.- Tohoku University, Department of Materials Science.- Tohoku University.- D. Appendix D. Highlights of Recent U.S. Research andDevelopment Activities.- E. Appendix E. Glossary.- F. Appendix F. Index of Sites.