Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology
Autor Saburo Nonogaki, Ueno Takumi, Toshio Itoen Limba Engleză Hardback – 25 iun 1998
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Specificații
ISBN-13: 9780824799519
ISBN-10: 0824799518
Pagini: 336
Dimensiuni: 152 x 229 x 22 mm
Greutate: 0.6 kg
Ediția:New.
Editura: CRC Press
Colecția CRC Press
ISBN-10: 0824799518
Pagini: 336
Dimensiuni: 152 x 229 x 22 mm
Greutate: 0.6 kg
Ediția:New.
Editura: CRC Press
Colecția CRC Press
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Public țintă
ProfessionalCuprins
Exposure systems in photolithography; optical pattern transfer; chemistry of photoresist materials; practical processes in microlithography; X-ray lithography; electron-beam lithography; variations in microlithographic process.
Notă biografică
Saburo Nonogaki, Ueno Takumi, Toshio Ito
Descriere
"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."