This book focuses on various issues concerned with scanning electron microscopy, as well as its theoretical and practical applications. Fine focused electron and ion beams constitute(s) an inevitable part of methods and instruments employed in various science fields. SEMs are well instrumented and supplemented with advanced techniques and methods and thereby present endless possibilities in the areas of quantitative measurement of object topologies, surface imaging, performing elemental analysis and local electrophysical characteristics of semiconductor structures. Creation of micro and nanostructures involves extensive use of fine focused e-beam. Numerous topics are covered under two sections "Instrumentation, Methodology" and "Biology, Medicine" for electronic industry. This book includes contributions by renowned researchers and experts in this field.