Emerging Technologies for In Situ Processing: NATO Science Series E:, cartea 139

1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation.- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices.- 3. Laser Etching and Microelectronic Applications.- 4. Laser-Induced Chemical Processing of Materials.- 5. High Technology Manufacturing: Critical Issues for the Future.- 6. Ultra High Vacuum Processing: MBE.- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates.- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase.- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum.- 10. Excimer Laser Projection Patterning.- 11. Excimer Laser Patterning and Etching of Metals.- 12. Ion Projection Lithography.- 13. UV Light-Assisted Deposition of A1 on Si from TMA.- 14. E-Beam Induced Decomposition of Inorganic Solids.- 15. Electronic Connection Through Silicon Wafers.- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films.- 17. Focused Ion Beam Induced Deposition.- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks.- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation.- 20. Focused Ion Beam Technology and Applications.- 21. Laser Direct Writing for Device Applications.- 22. Laser-Induced Photoetching of Semiconductors with Chlorine.- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication.- 24. Synthesis and Characterization of Laser Driven Powders.- 25. Physical Properties of Laser Written Chromium Oxide Thin Films.- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime.- 27. Laser Assisted Plasma Etching of Silicon Dioxide.- 28. Nd: Yag Laser Processing for Circuit modification and DirectWriting of Silicon Conductors.- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine.- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.