Radio Frequency Sputtering
Editat de Aditya Sharma, Weon Cheol Lim, Poorva Sharma, Jitendra Pal Singhen Limba Engleză Hardback – 14 oct 2026
Fundamental and advanced RF sputtering techniques for thin-film applications
Controlling film thickness, composition, and uniformity remains a persistent challenge in thin-film fabrication. Radio Frequency Sputtering: Thin-Film Deposition and Device Applications covers both fundamental principles and advanced techniques of RF sputtering. Written by researchers from academic and industry laboratories, this reference provides practical guidance for optimizing deposition processes across electronic components, solar cells, and functional coatings.
The book provides step-by-step instructions for RF sputtering processes alongside clear definitions and illustrative examples. Dedicated sections on troubleshooting and process optimization offer targeted advice for overcoming common deposition challenges. Coverage extends to sustainability practices in sputtering operations and examines both established and emerging device applications, connecting process parameters to measurable outcomes in device performance.
Readers will also find:
- Detailed treatment of RF magnetron sputtering configurations and their influence on film quality across different substrate materials
- Guidance on controlling deposition parameters to achieve target film thickness, composition, and structural uniformity in production environments
- Coverage of thin-film applications in semiconductor devices, energy harvesting systems, and advanced functional coatings for diverse industries
- Discussion of emerging applications including spintronic devices, memory technologies, and materials designed for high-radiation environments
- Practical frameworks for integrating sustainability considerations into RF sputtering workflows and laboratory or manufacturing operations
Radio Frequency Sputtering serves materials scientists, semiconductor physicists, and engineers working in thin-film fabrication across academic and industrial settings. By connecting deposition fundamentals with device-level outcomes, this reference supports practitioners seeking to optimize RF sputtering processes for both research and production applications.
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Specificații
Notă biografică
Aditya Sharma is an Associate Professor of Physics at UPES, Dehradun, India. He has held research positions in South Korea and India, with extensive experience in energy harvesting and conversion, thin films, and nanomaterials. Dr. Sharma has guided numerous PhD and MS students throughout his career.
Weon Cheol Lim is a Senior Research Scientist at the Korea Institute of Science and Technology (KIST), Seoul, South Korea. He specializes in thin film deposition using RF magnetron sputtering and ion implantation, focusing on materials reliability in high-radiation environments such as space and nuclear reactors.
Poorva Sharma is an Associate Professor at Luzhou Vocational and Technical College, Luzhou, Sichuan, China. Her research focuses on multifunctional multiferroic materials for advanced spintronic and memory devices. Dr. Sharma has published over 50 scientific papers and has received several prestigious awards.
Jitendra Pal Singh is a Visiting Scientist at the Korea Institute of Science and Technology, South Korea, with research positions held in India, Taiwan, and South Korea. His research interests include irradiation studies in nanoferrites, thin films, and magnetic multilayers, contributing to radiation-environment materials science.
Cuprins
1. Mechanistic understanding of Sputtering
2. Advancement in Sputtering Experimental Set-Up
3. Phenomenological understanding of film growth by sputtering
4. Atomic scale understanding of sputtering assisted film growth by X-ray absorption spectroscopy
5. Ion beam sputtering
6. High Power Pulsed Magnetron Sputtering
7. Reactive Magnetron Sputtering
8. Epitaxial Growth via Radio Frequency Sputtering Process
9. Deposition of layer for solar cells
10. Deposition of Solar Cell Layers Using the Sputtering Technique
11. Sputtering assisted growth of magnetic thin films
12. Sputtering for Growth of Oxides from Metal Targets
13. Ion Beam Sputtering for the Growth of Magnetic Tunnel Junctions
14. Deposition of thin films for magnetoresistive devices using sputtering
15. Sputtering for thin film batteries
16. Sputtering for semiconductor devices
17. Development of Sputtered Metal Oxide Heterostructures for Advanced Photodetectors
18. A Study of Rf - Sputtered TCO as Antireflection Coating for Solar Cell Application