Cantitate/Preț
Produs
Total produse
Vezi coșul
Plasma Processing of Semiconductors de P F Williams

Plasma Processing of Semiconductors

Editat de P F Williams
en Limba Engleză Paperback – 12 oct 2012
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications.
Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Citește tot Restrânge

Preț: 175694 lei

Preț vechi: 214261 lei
-18%

Puncte Express: 2635
Preț estimativ în valută:
31064€ • 36657$ • 27205£

Carte tipărită la comandă

Livrare economică 13-27 aprilie

 Adaugă în coș

Wish list
Gift list
Am citit!
Adaugă în listă

Specificații

ISBN-13: 9789401064866
ISBN-10: 9401064865
Pagini: 613
Ilustrații: X, 613 p.
Dimensiuni: 160 x 240 x 34 mm
Greutate: 0.99 kg
Ediția:Softcover Reprint of the Original 1st 1997 edition
Editura: Springer
Locul publicării:Dordrecht, Netherlands

Public țintă

Research

Cuprins

Plasma Etching.- to Plasma Etching.- Plasma Chemistry, Basic Processes and PECVD.- The Role of Ions in Reactive Ion Etching with Low Density Plasmas.- SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas.- Plasma Deposition.- to Plasma Enhanced Chemical Vapor Deposition.- Topography Evolution During Semiconductor Processing.- Deposition of Amorphous Silicon.- Plasma Sources.- High Density Sources for Plasma Etching.- Resonant Plasma Excitation by Electron Cyclotron Waves—Fundamentals and Applications.- The Transition from Capacitive to Inductive to Wave Sustained Discharges.- Physics of Surface-Wave Discharges.- Plasma-Surface Interactions.- Surface Science Aspects of Etching and Wall Reactions in High Density Plasmas.- Plasma-Surface Interactions.- Cl2 Plasma-Si Surface Interactions in Plasma Etching.- Numerical Modeling.- Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma Processing.- Fluid and Hybrid Models of Non Equilibrium Discharges.- Plasma Diagnostics.- Optical Diagnostics of Processing Plasmas.- Optical Diagnostics of Plasmas: A Tool for Process Control.- Infrared Absorption Spectroscopy as a Diagnostic for Processing Plasmas.- Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials.- Mass Spectrometry of Reactive Plasmas.- Less Conventional Processing Applications of Plasmas.- Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications.- Remote Plasma Processing.- Magnetized Surface-Wave Discharges for Submicrometer Pattern Transfer.- Dusty Plasmas: Fundamental Aspects and Industrial Applications.- Industrial Application of Plasmas for Processing.- Low Energy Plasma Beams for Semiconductor Technology.- Process Control Concepts.- Issuesand Solutions for Applying Process Control to Semiconductor Manufacturing.