Cui, Z: Nanofabrication
en Limba Engleză Paperback – 4 noi 2010
Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed.
Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including:
- Photon-based lithography
- Charged particle beams lithography
- Nanofabrication using scanning probes
- Nanoscale replication
- Nanoscale pattern transfer
- Indirect nanofabrication
- Nanofabrication by self-assembly
Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering.
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Specificații
ISBN-13: 9781441945365
ISBN-10: 1441945369
Pagini: 360
Ilustrații: XIV, 343 p. 177 illus.
Dimensiuni: 155 x 235 x 20 mm
Greutate: 0.55 kg
Ediția:2008
Editura: Springer
Locul publicării:New York, NY, United States
ISBN-10: 1441945369
Pagini: 360
Ilustrații: XIV, 343 p. 177 illus.
Dimensiuni: 155 x 235 x 20 mm
Greutate: 0.55 kg
Ediția:2008
Editura: Springer
Locul publicării:New York, NY, United States
Public țintă
ResearchCuprins
Nanofabrication by Photons.- Nanofabrication by Charged Beams.- Nanofabrication by Scanning Probes.- Nanofabrication by Replication.- Nanoscale Pattern Transfer.- Indirect Nanofabrication.- Nanofabrication by Self-Assembly.
Textul de pe ultima copertă
Nanofabrication: Principles, Capabilities and Limits presents a one-stop description at the introductory level on most technologies that have been developed which are capable of making structures below 100nm.
Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed.
Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including:
Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering.
Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed.
Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including:
- Photon-based lithography
- Charged particle beams lithography
- Nanofabrication using scanning probes
- Nanoscale replication
- Nanoscale pattern transfer
- Indirect nanofabrication
- Nanofabrication by self-assembly
Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering.
Caracteristici
Provides the reader with the most up to date information and development in the Nanofabrication area Readers will learn the advantages and disadvantages of specific nanofabrication techniques depending on the application they are working on Focuses on the practical aspects of nanofabrication with examples drawn from both primary research and industrial applications Provides detailed information and a description of emerging molecular self-assembly techniques which are increasingly being used as ways of making nanostructures
Notă biografică
Zheng Cui, PhD, is a professor at and Director of the Department of Printed Electronics at the Suzhou Institute of Nanotech and Nanobionics, Chinese Academy of Sciences. He received his PhD from Southeast University in Nanjing, China, and has been a Visiting Fellow at the Microelectronics Research Center at Cambridge University, as well as a Senior Scientist and Principal Scientist at Central Microstructure Facility in Rutherford Appleton Laboratory.