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Chemistry and Lithography de Uzodinma Okoroanyanwu

Chemistry and Lithography: SPIE Press Monograph

Autor Uzodinma Okoroanyanwu
en Limba Engleză Hardback – 14 apr 2010
Provides a treatment of the chemical phenomena in lithography. This book presents topics on the optical and charged particle physics practiced in lithography, with a view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age.
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Specificații

ISBN-13: 9780819475626
ISBN-10: 0819475629
Pagini: 900
Dimensiuni: 181 x 258 x 57 mm
Greutate: 1.95 kg
Editura: SPIE
Seria SPIE Press Monograph

Cuprins

Introduction; Invention of Lithography and Photolithography; Chemical and Optical Origins of Lithography; Evolution of Lithography; Lithographic Chemicals and Materials; Negative Resists; Positive Resists; General Considerations on the Radiation and Photochemistry of Resists; Anti-Reflection Coatings; Stone, Plate and Offset Lithography; The Semiconductor Lithographic Process; Lithographic Modeling; Optical Lithography; Charged Particle Lithography; Implementation of Lithography in Integrated Circuit Device Fabrication; Advanced Lithographic Processing.

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This book will be of interest to all involved in the semiconductor industry. Offering a complete overview of the topic of lithography it will be of interest to practitioners, researchers and students. Chemists, Electrical Engineers, chip designers and manufacturers. Conferences: OSA, ISSCC, ISCS, EMC, ICASSP.