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Engineering Thin Films and Nanostructures with Ion Beams


en Limba Engleză Paperback – 19 iun 2019
Whileion-beamtechniqueshavebeenusedtocreatethinfilmsinthesemiconductorindustryforseveraldecades,thesemethodshavebeentoocostlyforothersurfacetreatmentapplications.However,asmanufacturingdevicesbecomeincreasinglysmaller,theuseofadirected-energyionbeamisfindingnovelindustrialapplicationsthatrequirethecustomtailoringofnewmaterialsanddevices,includingmagneticstoragedevices,photonics,opto-electronics,andmoleculartransport.EngineeringThinFilmsandNanostructureswithIonBeamsoffersathoroughnarrativeoftherecentadvancesthatmakethistechnologyrelevanttocurrentandfutureapplications.Featuringinternationallyrecognizedresearchers,thebookcompilestheirexpertiseinamultidimensionalsourcethat:
  • Highlightsthemechanismsandvisualevidenceoftheeffectsofsingle-ionimpactsonmetallicsurfaces
  • Considershowion-beamtechniquescanhelpachievehigherdisk-drivedensities
  • Introducesgas-clusterion-beamtechnologyandreviewsitsprecedents
  • Explainshowionbeamsareusedtoaggregatemetalsandsemiconductorsintonanoclusterswithnonlinearopticalproperties
  • Addressescurrentchallengesinbuildingequipmentneededtoproducenanostructuresinanindustrialsetting
  • Examinesthecombinationofion-beamtechniques,particularlywithphysicalvapordeposition
  • Delineatesthefabricationofnanopillars,nanoflowers,andinterconnectednanochannelsinthreedimensionsbyusingatomicshadowingtechniques
  • Illustratestheproductionofnanoporesofvaryingdimensionsinpolymerfilms,alloys,andsuperconductorsusingion-beamirradiation
  • Showshowfingerprintscanbemademorereliableasforensicevidencebyrecoil-mixingthemintothesubstrateusingionbeamsFromthebasicsoftheion-beammodificationofmaterialstostate-of-the-artapplications,EngineeringTh
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    Specificații

    ISBN-13: 9780367393052
    ISBN-10: 0367393050
    Pagini: 592
    Dimensiuni: 152 x 229 mm
    Greutate: 1.11 kg
    Editura: Taylor & Francis Ltd.